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E12900 - SEMI E129 - 半導体製造設備における静電気放電(ESD)の評価と制御へのガイド Revision:SEMI E129-0912 - Superseded SEMI MF928 — Test Method

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Description

SEMI MF928 — Test Method for Edge Contour of Circular Semiconductor Wafers and Rigid Disk Substrates

SEMI D20-0706 (technical revision)

5-0302 (technical revision)

there are often several words used by the semiconductor industry to describe the same concept or device

and so forth) are dealt with by other SEMI Standards

E12900 - SEMI E129 - 半導体製造設備における静電気放電(ESD)の評価と制御へのガイド Revision:SEMI E129-0912 - Superseded SEMI MF928 — Test Methodglobal Metrics Technical Committee2012830global Audits and Reviews Subcommittee20129www. semiviews. org www. semi. org20031120097 SEMI E78 ESD electrostatic dischargeESDEMI electromagnetic interference ESA electrostatic attraction COO cost of ownershipSEMI E35 International Technology Roadmap for Semiconductors(ITRS) SEMI E78 ESD ESD SEMI E78SEMI E43 1 12. 71SEMI E129SEMI E78 EMIESDESD SEMI E78 67 Referenced SEMI Standards SEMI E33 Specification for

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